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Since 1997, the laboratory activities have been concentrating on Nitride
semiconductors. The wide band gap InN, GaN,
and AlN, have large direct band gaps of 0.7eV, 3.4eV and 6.2eV, respectively.
They form a continuous alloy system covering the visible to UV spectral
range. The group III-nitrides are promising materials
for a wide variety of optoelectronic applications. The implementation of
optical devices has reached a very exciting stage, were both commercial
and scientific advantages are visible. Implemented photonic devices include
detectors, Light Emitting Diodes (LEDs), and laser diodes (LDs) in the blue
to the ultraviolet (UV) range. The electronic devices include high power,
and high frequency Field Effect Transistors (FETs), and Heterojunction Bipolar
Transistors (HBTs) for power switching applications.
The laboratory activities are listed below:
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The growing interest in high power microwave
electronic devices has also focused attention on group III-nitrides.
The electronic device described in this work is a field effect transistors
based on AlGaN/GaN heterostructure (HFET), for high power microwave amplification
and power witching applications.
Publications and Proceedings
- O. Katz, D. Mistele, B. Meyler, G. Bahir,
and J. Salzman, " Characteristics of InxAl1-xN/GaN High Electron Mobility
Field-Effect Transistor ", to be published in IEEE Trans Elec. Dev. (2004)
- O. Katz, D. Mistele,
B. Meyler, G. Bahir, and J. Salzman, "InAlN/GaN Heterostructure Field-Effect
Transistor DC and Small Signal Characteristics", Electronics Letters, 40 (20),
p.1304 (2004)
- O. Katz, Y. Roichman,
G. Bahir, N. Tessler, and J. Salzman, " Charge Carrier Mobility in Field Effect
Transistors: Analysis of Capacitance-Conductance Measurements", to be published
in Semicond. Sci. Tech. (2004)
- O. Katz, A.Horn,
G. Bahir, and J. Salzman, “Electron mobility in an AlGaN/GaN two-dimensional
electron gas I – carrier concentration dependent mobility”, IEEE
Trans. Elec. Dev. 50 (10),p.2002 (2003)
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D. Mistele, T. Rotter, A. Horn,
O. Katz, Z. Bougrioua, J. Aderhold, J. Graul, G. Bahir, J. Salzman,
"Incorporation of dielectric layers into the processing of III-Nitride
based heterostructure filed-effect transistors", Journal of Electronic
Materials, 32 (5), p.355 (2003)
- O.
Katz, D. Mistele, B. Meyler, G. Bahir, and J. Salzman ” Polarization engineering
of InAlN/GaN HFET and the effect on DC and RF performance”, (IEDM2004) International
Electron Device Meeting, San-Francisco, USA (2004).
- O. Katz, D. Mistele,
A. Horn, G. Bahir, and J. Salzman ” The Dynamics of persistent photo-effects
in AlGaN/GaN based HFET”, (IWN2004) International Workshop on Nitride
Semiconductors, Pittsburgh, USA (2004).[PDF]
- David
Mistele, Oded Katz, Gad Bahir and Joseph Salzman, "Impact of Native
Oxides at the Surface and Interface of AlGaN/GaN HFET Devices",(IWN2004)
International Workshop on Nitride Semiconductors, Pittsburgh, USA (2004).
- O.
Katz, A. Horn, G. Bahir, and J. Salzman, ”AlGaN/GaN Heterojunction
FET mobility measurement for non-uniform channel mobility”, (ICNS5)
The Fifth International Conference on Nitride Semiconductors, Japan
(2003).
- J.
Salzman, G. Bahir, O. Katz, “Persistent effects, stretched exponentials,
and trapping in Semiconductors” (PLMCN3) The 3rd Physics of Light Matter
Coupling in Nanostructures, Acireale, Sicily, Italy (2003).[PDF]
- O.
Katz, A. Horn, G. Bahir, and J. Salzman, ”AlGaN/GaN heterojunction
fat FET drift mobility measurements and voltage dependencies”, (MRS)
Material Research Society 2002 fall meeting, Boston, USA (2002).[PDF]
Presentations
- O. Katz "Nitride Based High Power
HHETs" [PDF]
- O. Katz "GaN Electronics" 19th Umbrella
Symposium, Aachen, Germany (2004). [PDF]
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Technion- AlGaN/GaN
0.4 µm Gate HFET. |
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In recent years, wide band gap materials
such as GaN and AlGaN compounds, are considered most appropriate
for optoelectronics in the UV region.
GaN and the ternary alloy AlGaN have a direct band gap, suitable for
UV detection at wavelengths from 200 nm to 365 nm.
Publications and Proceedings
- O. Katz,
G. Bahir, and J. Salzman, "Persistent photocurrent and surface trapping
in GaN Schottky ultraviolet detectors", Appl. Phys. Lett. 84 (20), p.4092
(2004)
- O. Katz,
V. Garber, B. Meyler, G. Bahir, and J. Salzman, ”Anisotropy in detectivity
of GaN Schottky Ultraviolet detectors – comparing lateral and vertical
geometry”, Appl. Phys. Lett. 80 (3), p.347 (2002)
- O. Katz,
V. Garber, B. Meyler, G. Bahir, and J. Salzman, “Gain mechanism in GaN
Schottky Ultraviolet detectors”, Appl. Phys. Lett. 79 (10), p.1417 (2001)
- O. Katz,
B. Meyler, U. Tisch, J. Salzman, ”Determination of Band-Gap Bowing for
AlGaN Alloys”, Phys. Stat. Sol. (a) 188 (2), p.789 (2001)
- O. Katz,
V. Garber, B. Meyler, G. Bahir, and J. Salzman, “Vertical versus Lateral
GaN Schottky Ultraviolet Detectors and Their Gain Mechanism”, Phys.
Stat. Sol. (a) 188 (1), p.345 (2001)
- U. Tisch,
B. Meyler, O. Katz, E. Finkman, and J. Salzman, “Dependence of the refractive
index of AlxGa1-xN on temperature and composition at elevated temperatures”,
J. Appl. Phys. 89 (5), p.2676 (2001).
- V. Garber,
G. Bahir, O. Katz, C. Uzan-Saguy, E. Baskin, and J. Salzman, “Geometrical
magneto resistance measurement of vertical conductivity in GaN and
comparison with lateral transport”, (IWN2000) Proceeding of International
Workshop on Nitride Semiconductors, Nagoya, Japan, p.455 (2000)
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Technion -
GaN 2 µm interdigitated Schottky photodetector.
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